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NEWS ARCHIVE
December 2005:
- European Mask and Lithography Conference 2006.
iCADA sponsors and exhibits at the EMLC 2006 (European Mask and
Lithography Conference) hold in Dresden 23 – 26 January 2006.
This conference is dedicated to the science, technology, engineering and
application of mask technologies, of lithography technologies, and of
associated technologies (like data processing, resist, metrology, inspection
and application). Details.
iCADA makes donation to Amnesty International
We thank you very much for all your X-Mas cards and the best wishes for
the new year. We also want to thank you for your confidence in iCADA and
wish you a very prosperous and healthy year 2006. We have made a donation
to Amnesty
International instead of sending out X-Mas cards and hope that this
finds your favor.
November 2005:
October 2005:
August 2005:
June 2005:
May 2005:
iCADA selected by Taiwanese customer as Reticle Management Supplier
iCADA has received a purchase order from a major 300mm fab in Taiwan for
their Reticle Management System (RSM). The RSM will be integrated into
the local IBM SiView infrastructure and will improve the reticle life
cycle management, reticle inspection management, inspection tool
connectivity and mask house connectivity. Furthermore the customer
sepcific business rule engine, requal and todo planning will help the
customer to minimize errors and thus reduces cycle time, defects and
costs.
(Details).
iCADA goes Japan
iCADA is strengthening its focus on the Japanese market. Our homepage is
now available in Japanese
For all inquiries in Japanese please feel free to contact our team
member Takeshi Hattori in Japan:
.
March 2005:
February 2005:
- iCADA Reticle Management System (RSM) now in production at a
new 300mm fab at one of our existing customers.
Installation, customization and integration into the new 300mm environment
was realized in less than 3 weeks.
"We are very impressed by the commitment
and expertise of iCADA's team members who managed to realize this important
task in a minimum time frame." stated the Director of the global MES
"... and we are looking forward to future new challenging projects with
iCADA."
January 2005:
- iCADA sponsors and exhibits at the EMLC 2005 - European Mask and
Lithography Conference - hold in Dresden 31 January - 3 February 2005.
This conference is dedicated to the science, technology, engineering and
application of mask technologies, of lithography technologies, and of
associated technologies (like data processing, resist, metrology, inspection
and application). Details.
- iCADA presents the 'Art of Reticle Management' at the Innovation
Forum hold in Dresden on 20/21 January 2005.
The innovation forum is a yearly event organized by a cooperation of four
companies to present innovative solutions for the automation of the
semiconductor industry. Details.
December 2004:
iCADA supports Asian Tsunami victims (Details).
iCADA makes donation to Amnesty International
We thank you very much for all your X-Mas cards and the best wishes for
the new year. We also want to thank you for your confidence in iCADA and
wish you a very prosperous and healthy year 2005. We have made a donation
to Amnesty
International instead of sending out X-Mas cards and hope that this
finds your favor.
November 2004:
Major chip manufacturer located in Singapore chooses iCADA as
its reticle management supplier
iCADA GmbH has received an order for their Reticle Management Software
(RSM) from a major worldwide chip supplier located in Singapore. (Details).
Visit us at SEMICON Japan
2004.
September 2004:
European chip manufacturer chooses iCADA as its worldwide reticle
management supplier
iCADA GmbH, a German based software company, has received an order for a
corporate license for their Reticle Management Software (RSM) from
a major European chip supplier. (Details).
Visit us at SEMICON Taiwan
2004.
June 2004:
Visit us at SEMICON West 2004.
Come to meet our reticle management experts. We will provide life demos of
all our software packages. (Details)
Furthermore we will demonstrate our newest product for ESD tracking:
Enviro Tracker - ESD tracking
.
EnviroTracker™, placed in a reticle carrier, travels along with the
reticle throughout the entire process anywhere in the fab and collects the
data on the reticle ESD exposure. At any time the collected data can be
read via RFID link and the exposure status of the reticle will be
known. If a reticle has been exposed to ESD, this reticle can be rerouted
to inspection rather than to be a cause of defects in the ICs. Using
collected data the locations of ESD exposure can be identified for
correcting ESD environment problems and improving yield.
(Details).
May 2004:
New RSM version 3.5 released:
Lots of new features and enhancements have been realized:
- Improved web wizards for modeling fab specific procedures,
e.g. reticle entry, blow off, etc.
- Hierarchical grouping of reticle locations, hierarchical administration
of users and user groups, etc.
- Multi language support per user, e.g. English, French, Chinese,
Japanese, Korean, etc.
(Details).
Mask Vendor Connectivity (MaVen) now in production
The RSM mask house interface provides for data exchange with mask suppliers
using the SEMI standard P10. Reticle records in the RSM database are
automatically created when the reticle order file is send to the mask-house.
The progress of the manufacturing process in the mask house, e.g. production
status, estimated time of arrival (ETA), etc. can be monitored with the RSM.
Upon delivery of the reticle the electronic Certificate of Conformance (CofC)
is automatically validated and verified with the original reticle order file.
The RSM then supports the corresponding authority to sign-off the new reticle
for production use in the fab. (Details).
March 2004:
Februray 2004:
October 2003:
-
iCADA names AceTeam its
exclusive distributor in Taiwan. AceTeam is a young and fast expanding agent
company based next to the famous Science Industrial Park in Hsinchu
Taiwan (Taiwan's silicon valley). The experienced team members will work
closely with the Taiwanese customers to sell and support iCADA's Reticle
Management solutions.
July 2003:
June 2003:
May 2003:
March 2003:
iCADA proudly announces a new product for advanced reticle inspection
analysis reducing production loss and rework:
New product: GO / NO-GO
Box
The iCADA GO / NO-GO Box performs an in-depth analysis of reticle surface
inspections and recognizes defect patterns such as scratches and torn
pellicles prior to exposure (Details).
Visit us at SEMICON Europa 2003.
February 2003:
December 2002:
iCADA wins against competitors and finalizes major deal with a
European customer (Details).
iCADA receives the Editors' Choice Best Product Award for
its Reticle Management Software (Details).
Visit us at the European Mask Conference 13th Jan - 15th Jan 2003
in Sonthofen, Germany (Details)
October 2002:
-
iCADA names Aneric
its exclusive distributor in major Asian countries (Details).
September 2002:
- iCADA provides a new world-time
service for their international customers and partners.
August 2002:
- iCADA supports the East German flood victims (Details).
July 2002:
Further RSM improvements:
- SEMI E-109 compliant (98%).
- Further enhancements to our photo dispatch connectivity .
- Several new features bringing carrier and transponder management even
further beyond SEMI E99.
June 2002:
- Reticle Management now supports EAPSM masks.
May 2002:
- First Mediation Device sold to
the U.S.
- Further integrations of new KLA-Starlight Models (KLA TerraStar, KLA
Ligthning, etc.) and NIKON PPD inspection systems (see RIM).
March 2002:
January 2002:
Further RSM improvements:
- Enhanced inspection
support for improved preventive maintenance.
(defect
classification, delta maps, overlay maps,...)
- 3D PDS Map now available via RSM Web.
December 2001:
August 2001:
- RSM now optimized for AMHS & Transport Conveyors.
- 300 mm ready.
July 2001:
New RSM improvements:
- SEMI E-109 (prelimanary) compliant.
- Carrier & Transponder Management
(including Carrier Content Recognition on Multi-SMIF batches).
- Reticle Tunneling Optimization in multi slot carriers.
June 2001:
Back to our news overview.
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