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POLLUX
Particle Detection for Photomasks leads to higher yields
Dr. Schenk's Pollux - the automated Particle Detection System enables fabs to perform a complete inspection on each photomask prior to its use.
Pollux inspects the surfaces of the glass side and the pellicle side of the photomask for imperfections down to 10 µm (ESD*) and detects particulate contamination and defects, such as glass scratches and holes in the pellicle.
Pollux automatically determines the frame height and the area to be inspected. No manual adjustment or parameter setting is needed to adapt the system for the mask to be inspected. Each fab can individually determine the threshold, according to the minimum size of particles that are of interest.
Pollux offers a user-friendly graphical user interface (GUI) according to SEMI-Norm. The number of detected particles on the glass and pellicle side are reported. Contamination data, such as the number of detected particles, ESD* size and xy-coordinates are displayed in a defect map, defect table and defect size histogram, providing a quick overview.
Pollux has been designed for implementation, either in Reticle Stockers, Steppers or Cleaning Stations, or can also be applied as a Stand-Alone unit.
* ESD: Equivalent Sphere Diameter
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